Vacuum sublimation device

Patente en EEUU: US 18/840,772 - PCT/ES2023/070034Vacuum sublimation methods are used, on one hand, for the purification and recrystallization of molecules, and, on the other hand, to study the reactivity of materials on different substrates. Current methods deposit crystalline materials in intermediate surfaces needing additional steps to deposit in the desired substrates. These methods may need ultra-high vacuum sublimation equipment, complex equipment, implying great difficulties in preparing the samples. The new device allows direct sublimation in surfaces, opening a wide range of possibilities about the nature of surfaces, including the possibility that the Surface is a device on itself. With the new sublimator the distance between the material and the surface can be adjusted and sublimation parameters, such as temperature and pressure, can be optimized and controlled. Main innovations and advantages  Direct deposition on the surface of interest.  The device can be used in standard R+D laboratories.  Adjustable distance between the substrate and the sample for a better control and reproducibility of the sublimation.  Low-cost device with interchangeable pieces, easy to replace.  Compatible with a huge number of surfaces of different nature, dimensions and functions, including final devices.